We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods, much like the AmbrosioTortorelli's approximation of the MumfordShah functional in image processing. © 2012 World Scientific Publishing Company.

Analysis of an inverse problem arising in photolithography

Rondi L.;
2012-01-01

Abstract

We consider the inverse problem of determining an optical mask that produces a desired circuit pattern in photolithography. We set the problem as a shape design problem in which the unknown is a two-dimensional domain. The relationship between the target shape and the unknown is modeled through diffractive optics. We develop a variational formulation that is well-posed and propose an approximation that can be shown to have convergence properties. The approximate problem can serve as a foundation to numerical methods, much like the AmbrosioTortorelli's approximation of the MumfordShah functional in image processing. © 2012 World Scientific Publishing Company.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/1440994
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