The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanning electron Microscopy is discussed. A quantitative model to obtain the diffusion coefficients of the metals in the silicides layers is presented.

Reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples

MILANESE, CHIARA;ANSELMI TAMBURINI, UMBERTO;MAGLIA, FILIPPO
2003-01-01

Abstract

The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanning electron Microscopy is discussed. A quantitative model to obtain the diffusion coefficients of the metals in the silicides layers is presented.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/15200
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