By kinetic simulation, the significant features of the mechanism of the low-temperature photo-oxidation of hexafluoropropene were elucidated and the rate constants for the major elementary reactions of the intermediate fluorinated peroxy and alkoxy radicals were determined through a best-fit procedure. Comparison with analogue reactions in non-fluorinated systems showed a significant increase in reactivity for the self-reaction and double bond addition by peroxy radicals and β-scission by alkoxy radicals, which are discussed in terms of fluorine substituent effects.
Kinetic modelling of the low-temperature photo-oxidation of hexafluoropropene
FAUCITANO, ANTONIO;BUTTAFAVA, ARMANDO;COMINCIOLI, VALERIANO;
1991-01-01
Abstract
By kinetic simulation, the significant features of the mechanism of the low-temperature photo-oxidation of hexafluoropropene were elucidated and the rate constants for the major elementary reactions of the intermediate fluorinated peroxy and alkoxy radicals were determined through a best-fit procedure. Comparison with analogue reactions in non-fluorinated systems showed a significant increase in reactivity for the self-reaction and double bond addition by peroxy radicals and β-scission by alkoxy radicals, which are discussed in terms of fluorine substituent effects.File in questo prodotto:
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