A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples and to calculate the diffusion coefficients and the interdiffusion coefficients is presented.
Transition metal silicides: growth in metal-silicon diffusion couples
ANSELMI TAMBURINI, UMBERTO;MILANESE, CHIARA;MAGLIA, FILIPPO;
2002-01-01
Abstract
A mathematical model to describe the growth of silicides layers in metal - silicon diffusion couples and to calculate the diffusion coefficients and the interdiffusion coefficients is presented.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
