The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is followed by scanning electron microscopy. A model to evaluate the kinetic growth of the layer and the diffusion and interdiffusion coefficients is presented.
Growth of vanadium and tantalum silicides in bulk diffusion couples
MILANESE, CHIARA;MAGLIA, FILIPPO;ANSELMI TAMBURINI, UMBERTO;
2002-01-01
Abstract
The growth of vanadium and tantalum silicides layers in the metal - Si bulk diffusion couples is followed by scanning electron microscopy. A model to evaluate the kinetic growth of the layer and the diffusion and interdiffusion coefficients is presented.File in questo prodotto:
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