Soft imprinting lithography assisted by ultraviolet (UV) light (soft UV-NIL) takes advantage of both UV-nanoimprint and soft lithography. This technique, which can be applied for the replication of nanometer size features over large areas, is suitable for the patterning of nanostructures like photonic crystals with high throughput and high accuracy. In this work, we demonstrate the fabrication of two dimensional silicon-on-insulator photonic crystal slabs with and without line defects by using soft UV-NIL. Measurement of photonic mode dispersion by means of variable angle reflectance assesses the quality of the fabricated samples.

Fabrication of SOI photonic crystal slabs by soft UV-nanoimprint lithography

BELOTTI, MICHELE;GERACE, DARIO;ANDREANI, LUCIO;GALLI, MATTEO;
2006

Abstract

Soft imprinting lithography assisted by ultraviolet (UV) light (soft UV-NIL) takes advantage of both UV-nanoimprint and soft lithography. This technique, which can be applied for the replication of nanometer size features over large areas, is suitable for the patterning of nanostructures like photonic crystals with high throughput and high accuracy. In this work, we demonstrate the fabrication of two dimensional silicon-on-insulator photonic crystal slabs with and without line defects by using soft UV-NIL. Measurement of photonic mode dispersion by means of variable angle reflectance assesses the quality of the fabricated samples.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/106259
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