The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.
Unique Polymers Via Radical Diene Cyclization: Poly(spironorbornanes) and Their Application to 193 nm Microlithography
PASINI, DARIO;
1999-01-01
Abstract
The design of novel alkylated norcamphor derivatives that undergo cyclopolymerization is explored; the resulting polymers incorporate suitable functional groups for chemical amplification and show excellent imaging characteristics under lithographic exposure at 193 nm.File in questo prodotto:
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