For 193 mm lithographic applications robust polymers containing a high carbon/hydrogen ratio are required. In this paper a novel cyclopolymerization approach is presented for producing chemically amplified resists that are transparent at the imaging wavelength. Upon exposure to a 193 nm laser stepper, features 160 nm in size can readily be obtained (see Fig.).
Novel Design of Carbon-Rich Polymers for 193 nm Microlithography: Adamantane-Containing Cyclopolymers
PASINI, DARIO;
2000-01-01
Abstract
For 193 mm lithographic applications robust polymers containing a high carbon/hydrogen ratio are required. In this paper a novel cyclopolymerization approach is presented for producing chemically amplified resists that are transparent at the imaging wavelength. Upon exposure to a 193 nm laser stepper, features 160 nm in size can readily be obtained (see Fig.).File in questo prodotto:
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