P-type macroporous silicon for two-dimensional photonic crystals was discussed. Electrochemical etching was used on p-type doped silicon. Results showed that current density, the HF concentration and duration of etching effect the macroporous structures of p-type silicon.

P-type macroporous silicon for two-dimensional photonic crystals

GALLI, MATTEO;PATRINI, MADDALENA;MARABELLI, FRANCO
2002-01-01

Abstract

P-type macroporous silicon for two-dimensional photonic crystals was discussed. Electrochemical etching was used on p-type doped silicon. Results showed that current density, the HF concentration and duration of etching effect the macroporous structures of p-type silicon.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/131561
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