This review focuses on the physical and chemical vapor deposition methods applied to the preparation of all-inorganic metal halide perovskites. Particular emphasis is devoted to the specific characteristic of the available approaches explored in the current literature for lead-based and lead-free films with also examples of the preparation of microstructure and nanostructure for applications beyond perovskite solar cells. Main characteristics, device architectures, and pros and cons of exploited vapor deposition methods are highlighted, providing a guide for future research in the field of all-inorganic perovskite growth.

Physical and chemical vapor deposition methods applied to all-inorganic metal halide perovskites

Bonomi S.;Malavasi L.
2020-01-01

Abstract

This review focuses on the physical and chemical vapor deposition methods applied to the preparation of all-inorganic metal halide perovskites. Particular emphasis is devoted to the specific characteristic of the available approaches explored in the current literature for lead-based and lead-free films with also examples of the preparation of microstructure and nanostructure for applications beyond perovskite solar cells. Main characteristics, device architectures, and pros and cons of exploited vapor deposition methods are highlighted, providing a guide for future research in the field of all-inorganic perovskite growth.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/1367638
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