We report on the fabrication and optical measurements of Silicon On Insulator (SOI) nanostructures designed for photonic applications. Patterning was carried out by either electron beam lithography or nanoimprint lithography, followed by reactive ion etching with a SF6 and CHF3 gas mixture. The two-dimensional photonic lattices obtained were studied by scanning electron microscopy and by measuring photonic band dispersion above the light cone with Astratov coupling technique, showing a good agreement with the theoretical calculations.

Investigation of SOI photonic crystals fabricated by both electron-beam lithography and nanoimprint lithography

BELOTTI, MICHELE;GALLI, MATTEO;BAJONI, DANIELE;ANDREANI, LUCIO;GUIZZETTI, GIORGIO;
2004

Abstract

We report on the fabrication and optical measurements of Silicon On Insulator (SOI) nanostructures designed for photonic applications. Patterning was carried out by either electron beam lithography or nanoimprint lithography, followed by reactive ion etching with a SF6 and CHF3 gas mixture. The two-dimensional photonic lattices obtained were studied by scanning electron microscopy and by measuring photonic band dispersion above the light cone with Astratov coupling technique, showing a good agreement with the theoretical calculations.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/138110
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