a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach– Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.

Amorphous silicon nitride: a suitable alloy for optical multilayered structures

GALLI, MATTEO;LISCIDINI, MARCO;ANDREANI, LUCIO;
2006

Abstract

a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach– Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/138112
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