a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach– Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.
Amorphous silicon nitride: a suitable alloy for optical multilayered structures
GALLI, MATTEO;LISCIDINI, MARCO;ANDREANI, LUCIO;
2006
Abstract
a-Si1-xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach– Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavities.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
