Preferential growth of anatase crystallites along different directions is known to deeply affect their photocatalytic properties, especially with respect to the exposure of the reactive {001} facets. Its extent can be easily quantified through simple geometric calculations, on the basis of crystal sizes extracted for specific directions by means of X-Ray Diffraction data analysis. Nevertheless, the actual results depend on themethod employed for such a quantification. Here we report on a comparative morphological investigation, performed by employing the Scherrer equation and the line profile from Rietveld refinements, on shapecontrolled anatase photocatalysts produced by employing HF as capping agent. Compared to the Rietveld-based method, the use of the Scherrer equation produces a systematic underestimation of crystallite dimensions, especially concerning the [100] direction, which in turn causes the percentage of exposed {001} crystal facets to be underestimated. Neglecting instrumental-related effects may further reduce the estimate.
Morphological characterization of shape-controlled TiO2 anatase through XRPD analysis
Coduri M.
;
2016-01-01
Abstract
Preferential growth of anatase crystallites along different directions is known to deeply affect their photocatalytic properties, especially with respect to the exposure of the reactive {001} facets. Its extent can be easily quantified through simple geometric calculations, on the basis of crystal sizes extracted for specific directions by means of X-Ray Diffraction data analysis. Nevertheless, the actual results depend on themethod employed for such a quantification. Here we report on a comparative morphological investigation, performed by employing the Scherrer equation and the line profile from Rietveld refinements, on shapecontrolled anatase photocatalysts produced by employing HF as capping agent. Compared to the Rietveld-based method, the use of the Scherrer equation produces a systematic underestimation of crystallite dimensions, especially concerning the [100] direction, which in turn causes the percentage of exposed {001} crystal facets to be underestimated. Neglecting instrumental-related effects may further reduce the estimate.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
