In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 μm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay. © 2010 Elsevier B.V. All rights reserved.
Nanopatterning of silica with mask-assisted ion implantation
Pellegrini G.;
2010-01-01
Abstract
In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO2 substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er3+ ions. The aim of this work is to study how Er3+ emission at 1.5 μm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er3+ emission and a change from single exponential to bi-exponential of the luminescence intensity decay. © 2010 Elsevier B.V. All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
