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P-type macroporous silicon for two-dimensional photonic crystals was discussed. Electrochemical etching was used on p-type doped silicon. Results showed that current density, the HF concentration and duration of etching effect the macroporous structures of p-type silicon.

P-type macroporous silicon for two-dimensional photonic crystals

GALLI, MATTEO;PATRINI, MADDALENA;MARABELLI, FRANCO
2002-01-01

Abstract

P-type macroporous silicon for two-dimensional photonic crystals was discussed. Electrochemical etching was used on p-type doped silicon. Results showed that current density, the HF concentration and duration of etching effect the macroporous structures of p-type silicon.
2002
The Physics category includes resources of a broad, general nature that contain materials from all areas of physics, The category also includes resources specifically concerned with the following physics sub-fields: mathematical physics, particle and nuclear physics, physics of fluids and plasmas, quantum physics, and theoretical physics.
JOURNAL OF APPLIED PHYSICS
sì
WOS:000179495100002
2-s2.0-0037115468
Sì, ma tipo non specificato
Inglese
Internazionale
STAMPA
92
6966
6972
silicon; photonic crystals; spectroscopy
8
info:eu-repo/semantics/article
262
Bettotti, P.; DAL NEGRO, L.; Gaburro, Z.; Pavesi, L.; Loi, A.; Galli, Matteo; Patrini, Maddalena; Marabelli, Franco
1 Contributo su Rivista::1.1 Articolo in rivista
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1.1 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/131561
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