This letter presents a 2-Mb embedded phase change memory (ePCM) macrocell designed in 90-nm BJT-CMOS-DMOS (BCD) technology able to address the next generation of automotive and smart-power products exploiting an ePCM cell based on a Ge-rich chalcogenide alloy. The optimized memory allows 16-ns random access time and 5-Mbit/s write throughput from −40 ◦C to 175 ◦C, with 100 kcycle endurance. The sense amplifier, the programming circuitry, and the data processing logic able to meet automotive requirements are described. The silicon results are provided.

2-Mb embedded phase change memory with 16-ns read access time and 5-Mb/s write throughput in 90-nm BCD technology for automotive applications

Zurla R.
;
Cabrini A.;Torelli G.;
2019-01-01

Abstract

This letter presents a 2-Mb embedded phase change memory (ePCM) macrocell designed in 90-nm BJT-CMOS-DMOS (BCD) technology able to address the next generation of automotive and smart-power products exploiting an ePCM cell based on a Ge-rich chalcogenide alloy. The optimized memory allows 16-ns random access time and 5-Mbit/s write throughput from −40 ◦C to 175 ◦C, with 100 kcycle endurance. The sense amplifier, the programming circuitry, and the data processing logic able to meet automotive requirements are described. The silicon results are provided.
2019
Electrical & Electronics Engineering
Esperti anonimi
Inglese
Internazionale
ELETTRONICO
2
9
135
138
4
AUTOMOTIVE APPLICATIONS, EMBEDDED MEMORY, GERMANIUM-RICH ALLOY, NONVOLATILE MEMORY, PHASE CHANGE MEMORY, SMART POWER DEVICES
http://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=8877954&isnumber=8871355
22
info:eu-repo/semantics/article
262
Carissimi, M.; Zurla, R.; Auricchio, C.; Calvetti, E.; Capecchi, L.; Croce, L.; Zanchi, S.; Rana, V.; Mishra, P.; Mukherjee, R.; Tyagi, V.; Disegni, F...espandi
1 Contributo su Rivista::1.1 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/1343979
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