We demonstrate 3 platforms based on silicon nitride layers processed at 350°C and tailored to have different refractive indices. With these platforms, we have successfully fabricated low loss waveguides at telecom wavelengths, temperature tolerant (de)multiplexing devices, nonlinear waveguides, photonic crystal cavities and waveguides.

Low-Temperature NH3-Free Silicon Nitride Platforms for Integrated Photonics

Lacava C.;Clementi M.;Bajoni D.;Galli M.;
2018-01-01

Abstract

We demonstrate 3 platforms based on silicon nitride layers processed at 350°C and tailored to have different refractive indices. With these platforms, we have successfully fabricated low loss waveguides at telecom wavelengths, temperature tolerant (de)multiplexing devices, nonlinear waveguides, photonic crystal cavities and waveguides.
2018
978-1-5386-5361-6
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/1344926
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 1
  • ???jsp.display-item.citation.isi??? 1
social impact