The growth of silicides of V and Ta is investigated in planar diffusion couples by Scanning electron microscopy. A quantitative model is applied to find the kinetics of growth and the self-diffusion coefficients.
Growth of vanadium and tantalum silicides in bulk diffusion couples
MILANESE, CHIARA;MAGLIA, FILIPPO;ANSELMI TAMBURINI, UMBERTO;
2003-01-01
Abstract
The growth of silicides of V and Ta is investigated in planar diffusion couples by Scanning electron microscopy. A quantitative model is applied to find the kinetics of growth and the self-diffusion coefficients.File in questo prodotto:
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