The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanning electron Microscopy is discussed. A quantitative model to obtain the diffusion coefficients of the metals in the silicides layers is presented.
Reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples
MILANESE, CHIARA;ANSELMI TAMBURINI, UMBERTO;MAGLIA, FILIPPO
2003-01-01
Abstract
The reactive growth of silicides in M (Nb, Ta, V) - Si bulk diffusion couples as observed by Scanning electron Microscopy is discussed. A quantitative model to obtain the diffusion coefficients of the metals in the silicides layers is presented.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
