This article investigates the neutron irradiation effects on the random telegraph signal (RTS) observed in the dark count rate (DCR) of single-photon avalanche diodes (SPADs) fab ricated in a 150-nm complementary metal–oxide–semiconductor (CMOS) technology. Two similar chips, F2 and S2, were exposed to neutron fluences of 4.15 × 1010 and 3.90 × 109 1 MeV neutron equivalent cm−2, respectively. Time-resolved DCR mea surements were acquired both before and after irradiation. RTS detection and characterization techniques are discussed, revealing that although the weighted-time-lag plot (W-TLP) is effective in accurately detecting RTS levels, it presents chal lenges in extracting other RTS characteristics. The primary effect observed in the irradiated samples is an increase in the number of pixels exhibiting RTS post-irradiation, along with more complex RTS behavior, attributed to multi-stable RTS defects in neutron-induced clusters. To further understand these defects, temperature- and voltage-dependent measurements were conducted.

Characterization of Random Telegraph Signal in Neutron-Irradiated 150-nm CMOS SPADs

Shojaei, F.;Minga, J.;Torilla, G.;Ratti, L.;Vacchi, C.
2025-01-01

Abstract

This article investigates the neutron irradiation effects on the random telegraph signal (RTS) observed in the dark count rate (DCR) of single-photon avalanche diodes (SPADs) fab ricated in a 150-nm complementary metal–oxide–semiconductor (CMOS) technology. Two similar chips, F2 and S2, were exposed to neutron fluences of 4.15 × 1010 and 3.90 × 109 1 MeV neutron equivalent cm−2, respectively. Time-resolved DCR mea surements were acquired both before and after irradiation. RTS detection and characterization techniques are discussed, revealing that although the weighted-time-lag plot (W-TLP) is effective in accurately detecting RTS levels, it presents chal lenges in extracting other RTS characteristics. The primary effect observed in the irradiated samples is an increase in the number of pixels exhibiting RTS post-irradiation, along with more complex RTS behavior, attributed to multi-stable RTS defects in neutron-induced clusters. To further understand these defects, temperature- and voltage-dependent measurements were conducted.
2025
The Electrical and Electronics Engineering category covers resources concerned with applications of electricity, generally those involving current flow through conductors, as in motors and generators. This category also covers the examination of the conduction of electricity through gases or a vacuum as well as through semiconducting materials. Topics include image and signal processing, electromagnetics, electronic components and materials, microwave technology, and microelectronics.
Esperti anonimi
Inglese
Internazionale
STAMPA
72
12
3738
3748
11
Complementary metal–oxide–semiconductor (CMOS); dark count rate (DCR); random telegraph signal (RTS); single photon avalanche diodes (SPADs)
10
info:eu-repo/semantics/article
262
Shojaei, F.; Brogi, P.; Betta, G. -F. Dalla; Goiffon, V.; Marrocchesi, P. S.; Minga, J.; Pancheri, L.; Torilla, G.; Ratti, L.; Vacchi, C.
1 Contributo su Rivista::1.1 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11571/1549710
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