The growth of vanadium silicides in V-Si diffusion couples is followed by scanning electron microscopy. A suitable mathematical model to evaluate the kinetic growth and the diffusion coefficients of the metals in the silicides is proposed.
Growth of Vanadium Silicides in V-Si diffusion couples
ANSELMI TAMBURINI, UMBERTO;MILANESE, CHIARA;MAGLIA, FILIPPO;
2001-01-01
Abstract
The growth of vanadium silicides in V-Si diffusion couples is followed by scanning electron microscopy. A suitable mathematical model to evaluate the kinetic growth and the diffusion coefficients of the metals in the silicides is proposed.File in questo prodotto:
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